Date of Award


Degree Name

Master of Science


Metallurgical and Materials Engineering


Chintalapalle Ramana


Yttrium-doped hafnium oxide (YDH) nanocrystalline films were produced by sputter-deposition at various substrate times and temperatures, to produce YDH films in a wide range of thicknesses, dYDH∼25 to 1100 nm. The deposition was made onto optical grade quartz and sapphire substrates. Samples deposited on sapphire were subject to post-deposition annealing (PDA) at various times (3-24 hr) and temperatures (1100 - 1500 °C). The effect of d[special characters omitted]YDH on the crystal structure, surface/interface morphology and optical properties of YDH films was investigated. X-ray diffraction analyses revealed the formation of monoclinic phase for relatively thin films (<150nm). The evolution towards stabilized cubic phase with increasing dYDH [special characters omitted]is observed. The scanning electron microscopy results indicate the dense, columnar structure of YDH films as a function of dYDH. Spectrophotometry analyses indicate that the grown YDH films are transparent and exhibit interference fringes. The band gap was found to be ∼ 5.60 eV for monoclinic YDH films while distinct separation and an increase in band gap to 6.03 eV is evident with increasing dYDH and formation cubic YDH films. The PDA films band gaps were found to be between 5.31 and 5.72 eV, all of which exhibit secondary gaps. A correlation between growth conditions, annealing, phase evolution, and optical properties of the YDH nanocrystalline thin films is established.




Received from ProQuest

File Size

70 pages

File Format


Rights Holder

Alejandro Ortega